Kokusai Furnace Vertron Revolution (Brand-New)
Brand-New and absolute unused Kokusai large batch deposition equipment
Useable for
- Thin film deposition
CVD/oxide film deposition
Platform V3J3N
- Wafer size 200mm
- Original planned (not used) process name: HQ-SiO
- Product Wafer Load Size:100
- Process Temperature Range: 600-750 C
- Main Body ~ Utility Box (L): 2000 mm
See also Kokusai Webpage
