Süss Micro Tec ACS200 Gen 3

Equipment according the age in good in good shape,

however only one wafer stage is currently working 

2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"

Equipment inspection virtual or physical possible

Software Ver: B6.50

CB1 Amps: 300A

Vita Controller

Flow Point Model: Nano Valve

Gas Panel Type: Configurable

Wafer Size: 200mm (with conversion kit 150mm is possible)

M-Monitor: CRT

3 Chambers ATM EPI

With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC)

 Standard pneumatic waferlift

Center Finding System: OTF

Buffer robot: HP+

Piezocon sensor: No

VSB: Yes

Wide Body LL

Tool called "EPI39"

3 DXZ/CXZ Chambers for Centura/P5000Mainframe is transport rack 

- without UI Computer

- Envision, ESC, Fixed Gap

ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3

-Back end medium current Implanter

- 100002956  

The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.

Software: Win 10

OR 4000 WTM Controller

3x ENI Generator Racks

Chiller INR-498-011D

2x Remote Monitor

High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F

Software: Win 10

OR 4000 WTM Controller

3x ENI Generator Racks, Chiller INR-498-011D

2x Remote Monitor

High Density Plasma Process

Process Chambers: A,B,C

Orienter chamber F

System: 1x Mainframe

3x process chamber

1x Controller Rack

1x Chiller

3x ENI Generator Racks (Converted to separate water supply each Generator)

1x Controller Rack

x Chiller

3x ENI Generator Racks (Converted to separate water supply each Generator)

AMAT Vita/Delphin Controller

Tool will be sold without Software

AC Power Box, T/C Unit, T/H Controller 1+2, Chemical Cabinet, 4 Coater and 4 Developer

Last Time in production: 5/5/25