Software Ver: B6.50
CB1 Amps: 300A
Vita Controller
Flow Point Model: Nano Valve
Gas Panel Type: Configurable
Wafer Size: 200mm (with conversion kit 150mm is possible)
M-Monitor: CRT
3 Chambers ATM EPI
With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC)
Standard pneumatic waferlift
Center Finding System: OTF
Buffer robot: HP+
Piezocon sensor: No
VSB: Yes
Wide Body LL
Tool called "EPI39"
Brand new and unused EPI Centura ACP 300 mm
4 Chambers; Chamber code RH3, Lamp type BNA8 R3Mainframe Configuration E4 Single, 4 Facet SC ENP BLK2, Loadport AMAT Standard 300mm, EPI Water Module LT Design. RP EPI
Tool out of Project: "Yu Shan"
The original rough IFX Equipment procurement value was ~10,3 M€
Will be now sold for an attractive price.
Equipment is...
...brand new
...never used
...original packaged and crated
...located in Asia
...complete and fully functional
...professional stored in Warehouse
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